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Near-cathode plasma layer on CuCr contacts of vacuum arcs

2013Journal article Restricted access
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dc.contributor.authorAlmeida, Nelson A.
dc.contributor.authorBenilov, Mikhail S.
dc.contributor.authorBenilova, Larissa G.
dc.contributor.authorHartmann, Werner
dc.contributor.authorWenzel, Norbert
dc.date.accessioned2019-11-11T15:49:27Z
dc.date.available2019-11-11T15:49:27Z
dc.date.issued2013
dc.description.abstractA model of near-cathode layers in vacuum arcs is developed. The model relies on a numerical solution of the problem of near-cathode space-charge sheath with ionization of atoms emitted by the cathode surface, and allows the selfconsistent determination of all parameters of the near-cathode layer, including the ion backflow coefficient. The dependence of the density of energy flux from the plasma to the cathode surface on the local surface temperature is nonmonotonic with a maximum, a feature that plays an important role in the physics of plasma–cathode interaction. The developed model may be used for a variety of purposes, including as a module of complex nonstationary multidimensional numerical models of plasma– cathode interaction in vacuum arcs. As a simple example, an analytical evaluation of parameters of stationary spots on copper and chromium is given. In the case of composite CuCr contacts with large grains, spots with current of several tens of amperes burning on the copper matrix coexist with spots with currents of the order of 1 A burning on the chromium grains.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.citationAlmeida, N. A., Benilov, M. S., Benilova, L. G., Hartmann, W., & Wenzel, N. (2013). Near-cathode plasma layer on CuCr contacts of vacuum arcs. IEEE Transactions on Plasma Science, 41(8), 1938-1949.pt_PT
dc.identifier.doi10.1109/TPS.2013.2260832pt_PT
dc.identifier.urihttp://hdl.handle.net/10400.13/2597
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherInstitute of Electrical and Electronics Engineerspt_PT
dc.subjectCathode spotspt_PT
dc.subjectCircuit breakerspt_PT
dc.subjectComposite cathodespt_PT
dc.subjectNear-cathode plasma layerspt_PT
dc.subjectVacuum arcspt_PT
dc.subject.pt_PT
dc.subjectFaculdade de Ciências Exatas e da Engenhariapt_PT
dc.titleNear-cathode plasma layer on CuCr contacts of vacuum arcspt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage1949pt_PT
oaire.citation.startPage1938pt_PT
oaire.citation.titleIEEE Transactions on Plasma Sciencept_PT
oaire.citation.volume41(8)pt_PT
person.familyNameAlmeida
person.familyNameBenilov
person.givenNameNelson
person.givenNameMikhail
person.identifier.ciencia-id0516-6FAA-27E2
person.identifier.ciencia-id0F14-A79A-97C1
person.identifier.orcid0000-0002-6499-3609
person.identifier.orcid0000-0001-9059-1948
person.identifier.ridM-6228-2013
person.identifier.ridK-4443-2015
person.identifier.scopus-author-id7003469070
person.identifier.scopus-author-id7005138676
rcaap.rightsrestrictedAccesspt_PT
rcaap.typearticlept_PT
relation.isAuthorOfPublication9a82798a-90e3-41c4-a9dd-7974813221a8
relation.isAuthorOfPublication5ccf95a3-53d5-446c-857c-55d64b887175
relation.isAuthorOfPublication.latestForDiscovery5ccf95a3-53d5-446c-857c-55d64b887175

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